SLiM 100

1-ppb Class Chemical Metrology System for Lithography Process Tool Monitoring

Volatile organic compounds (VOCs) and inorganic compounds within the lithography process cause defects on reticles, hazing of scanner optics, and other serious problems that damage expensive lithography tools and can result in yield loss. The Picarro SLiM 100 Lithography Monitoring System is a 1-ppb class detection system that integrates Picarro’s industry leading cavity ring-down spectroscopy (CRDS) analyzers into a high-performance sampling system specifically for monitoring VOCs in the fab. The SLiM 100 system is a real-time measurement system that is designed to run 24/7 in the fab environment. It is a fully integrated chemical metrology system that is robust, easy-to-operate, and is ideal for use as a high-volume process monitoring and control system. The Picarro SLiM 100 has the capability to measure 10 organic compounds that negatively affect the lithography process with concentration sensitivity down to 1 part-per-billion. The system can also accommodate analyzers that measure inorganic molecules at parts-per-trillion concentration levels.

Product Photo: Picarro SLiM 100
Gas Detected VOC: Acetic Acid, Acetone, D3 Siloxane, HMDSO, IPA, PGME, TMS, D6 Siloxane, NMP, PGMEA
Inorganic (Optional): NH3, HF, HCl, SO2, H2S (Depending on choice of analyzers from table below)
Sampling Line 1/2" OD x 3/8" ID UHP-PFA tubing
Number of Ports 24 or 32
Dimensions Keyboard Tray Closed
  • 79" (H) × 34" (W) x 38" (D)
  • 2012 mm (H) × 864 mm (W) × 971 mm (D)
Keyboard Tray Open
  • 79" (H) × 34" (W) × 46" (D)
  • 2012 mm (H) x 864 mm (W) × 1172 mm (D)
Weight (without Analyzers)
  • 24 Port: 447 lbs (203 kg)
  • 32 Port: 482 Ibs (218 kg)
  • Add 75 lbs (34 kg) for each analyzer
Power Requirements 220-240 VAC single phase, 50/60 Hz, 20 Amp
Communication Ethernet TCP/IP, RESTful API
Warranty 12 months
Certifications CE, SEMI S2
Country of Manufacture USA
Analyzers Gases Measured
VOC Analyzer VOC-10*
SI3401 NH3, HF, HCl
SI2205 HF
SI2108 HCl
SI2104 H2S
SI2306 HF, NH3
SI2103 NH3
SI5450 SO2
VOC Typical Performance**
Precision (ppb), 600s, 3a
Acetic Acid 1.4
Acetone 0.7
D3_Siloxane 0.2
D6_Siloxane 0.1
IPA 1.4
NMP 0.5
PGME 1.8
TMS 1.6

*-VOC (Acetic Acid, Acetone, D3 Siloxane, HMDSO, IPA, PGME, TMS, D6 Siloxane, NMP, PGMEA)
**-Typical performance under standard background gas

Part Numbers (Other Combinations Available)
SL100-24-EK00 24 port AMC system for NH3, HF, VOC
SL100-32-K000 32 port AMC system for VOC
SL100-32-AK00 32 port stationary AMC system for NH3, HF, HCl, VOC
Components/Parts Actions Frequency
Particulate filter Replace Every 6 months
Pump Replace Every 2 years
Fan assemblies   Replace Every 2 years

Take The Next Step

Learn how Picarro's real-time, high sensitivity AMC monitoring solutions enable you to minimize excursions and yield loss in your semiconductor process.

Contact our Semiconductor Team